process control

Nova Fabrica release the FloTron X HR - a high optical resolution OES and process control system

Nova Fabrica has introduced the FloTron™ X HR, a high-resolution Plasma Emission Monitoring system with state-of-the-art multi-channel process control.

The FloTron™ X HR is a high-resolution plasma OES and process control system that comprises a UV-VIS-nIR CCD spectrometer with detector range 200-1100 nm and optical resolution better than 0.5 nm.

Nova Fabrica Release Optical Plasma Monitoring Solution for High Power Impulse Magnetron Sputtering (HIPIMS)

Nova Fabrica are pleased to announce release of Optical Plasma Monitoring solution for High Power Impulse Magnetron Sputtering (HIPIMS).

Nova Fabrica’s Optical Monitoring Sensor for HIPIMS features a unique intelligent design that out of the box will provide an excellent signal for a wide range of HIPIMS pulse frequencies and will deal comfortably with pulses coming in at irregular intervals. The signal provided by the new sensor is straight forward to interpret and therefore convenient to use.