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EN TECHNOLOGIES POWER SUPPLIES
- Highly reliable power supplies for DC & pulse sputtering, atmospheric pressure plasma, arc ion plating, cleaning & bias, ion beam.
- To minimize arc effect, the unique arc suppression technology applies reverse voltage within 200ns and drops current value to 0 within 2.5us at arcing to enable users to create thin film and yield.
- Maximum of 12 units (1 Master+11 Slave) can operate in parallel.
DETAILS
- 3Ph, 50/60Hz, 208 / 220 / 380V input
- Power, Current, Voltage regulations
- Low arc energy
- Higher endurance for Sag (SEMI F47)
- Forced Air cooling
- DeviceNet, Profibus, RS-232, RS-485
- English user manual
ARE YOU INTERESTED IN THESE PRODUCTS?
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